There are two photolithography systems: one with light source of wavelength λ1 = 156 nm (System 1) and another with light source of

Q. There are two photolithography systems: one with light source of wavelength λ1 = 156 nm (System 1) and another with light source of wavelength λ2 = 325 nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are L_min1 and L_min2 respectively, the ratio L_min1/L_min2 (correct to two decimal places) is                                                                       .

Ans: 0.47 – 0.51

Sol: